Photolithography Resolution Calculator
Work out photolithography resolution instantly with clear inputs, formula shown and shareable results.
About Photolithography Resolution Calculator
The Rayleigh criterion gives resolution as k1 x lambda / NA. With 193 nm immersion at NA 1.35 the single-exposure limit is around 38-44 nm half-pitch, which is why sub-20 nm nodes needed double and quadruple patterning until EUV at 13.5 nm arrived.
Formula
Rayleigh resolution
R = k1 x lambda / NA; multiple patterning divides the achievable pitch
Worked example
With the default values below, Photolithography Resolution Calculator returns Minimum resolvable half-pitch of 44.32. Change any input above and every figure here is recalculated in your browser.
Inputs used
- Exposure wavelength
- 193 nm
- Numerical aperture
- 1.35
- Process factor k1
- 0.31
- Multiple patterning passes
- 2 passes
Results
- Minimum resolvable half-pitch
- 44.32 nm
- Effective pitch after multiple patterning
- 44.32 nm
- Rayleigh limit at k1 = 0.25
- 35.74 nm
- Equivalent single-pass EUV k1
- 0.5417
Step by step
- 1Values used
- 2Rayleigh resolution
- 3Minimum resolvable half-pitch= 44.32 nm
- 4Effective pitch after multiple patterning= 44.32 nm
- 5Rayleigh limit at k1 = 0.25= 35.74 nm
- 6Equivalent single-pass EUV k1= 0.5417
Assumptions and limits
- The result is derived only from the 4 inputs listed above. Anything not among them is not part of the calculation.
- In particular, this calculator does not take inflation, tax, fees or charges or compounding frequency into account.
- Figures are rounded for display to 4 decimal places, so totals built from several rounded parts can differ slightly from the unrounded arithmetic.
How these calculators are built and tested is described on the Methodology page. If a figure looks wrong, please report it.
Frequently Asked Questions
Why is immersion lithography used?
Water between lens and wafer raises the refractive index, allowing NA above 1 — impossible in air — which directly improves resolution.
What does multiple patterning cost?
Each extra exposure adds mask cost, cycle time and overlay error. Quadruple patterning can make a single layer cost four times as much.
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